Handbook of Photomask Manufacturing Technology (English Edition)
| Autor | |
| Número de artículo | 8744263038 |
| DE,FR,ES,IT,CH,BE | |
| Terminal correspondant | Android, iPhone, iPad, PC |
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The second edition of this handbook provides an up-to-date reference on the individual processes, equipment, and materials of semiconductor manufacturing technologies.
Synopsis Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the "Handbook of Semiconductor Manufacturing Technology, Second Edition" features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field.
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Patterning of Ta/SiO2 high transmission EAPSM material for 193nm technology [Conference papers (reviewed)] in Photomask and Next-Generation Lithography Mask Technology XII, Proc. of SPIE Vol. 5853, Yokohama, Japan, June 28, 2005, pp. 463-473 (2005)
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Optimisation of properties can be achieved only if the properties of the final component are related to material properties as affected by production, changes (deliberate or otherwise) in material properties due to manufacturing processes at the semi-finished and finished stages (initial forming, re-forming, cutting, jointing, coating, material properties alteration), the effect of design configuration (external stress systems), and to inherent stresses induced by manufacture and loading ...
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Manufacturing Engineering and Technology, SI Edition, 7e, presents a mostly qualitative description of the science, technology, and practice of manufacturing. This includes detailed descriptions of manufacturing processes and the manufacturing enterprise that will help introduce students to important concepts.
